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The Pfeiffer Adixen medium duty A3P series semiconductor dry vacuum pumps are based on the proven multi-stage Roots technology. The inside of the pumps is resistant to corrosive gases. For this reason, the pumps have high reliability on medium duty processes. The three available models from the series offer a wide spectrum of pumping speeds and thereby cover most requirements for medium duty vacuum pumps in the semiconductor industry. The Pfeiffer Adixen A3P series is suitable for operation in a clean room and complies with CE and Semi S2 standards.

The dry pumps are distinguished through their high reliability for applications in medium duty processes. The pumps from the series have a temperature sensor and inert gas flushing. A low noise emission and low vibration level are further characteristics of the Pfeiffer Adixen A3P series.

The Pfeiffer Adixen ADH, A4H, and A4X harsh processes series dry semiconductor vacuum pumps are chemical processes used, for example, in the semiconductor and coating industries. These processes are harsh because primarily aggressive and corrosive mediums are used and processed under vacuum. These mediums have the highest requirements for the design and quality of the process systems. Typical harsh duty processes are etching, chemical vapor deposition (CVD), atomic layer deposition (ALD) as well as metal organic chemical vapor deposition (MOCVD).

Since aggressive and corrosive chemicals are used in harsh duty processes, the vacuum pumps and components must be corrosion-resistant. In the applications of the semiconductor and coating industries, there is frequently an increased occurrence of powder, which may lead to accumulation in the vacuum pumps. Thus, it must be made sure that the process pumps in use are suitable for this amount of powder. In order to best avoid condensation inside the pumps, purge gas is used in combination with a sophisticated temperature management.

More information about these
3881.66
Pfeiffer Vacuum Test leak H2/He, Pfeiffer-Adixen Dry Multi-Stage Roots Vacuum Pumps, Pfeiffer Adixen Dry Multi Stage Roots Vacuum Pumps,  PN  BG449025A
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Pfeiffer Vacuum Test leak H2/He, Pfeiffer-Adixen Dry Multi-Stage Roots Vacuum Pumps, Pfeiffer Adixen Dry Multi Stage Roots Vacuum Pumps,  PN  BG449025A

These Pfeiffer Vacuum Test leak H2/He  have part number BG449025A, are new, and come with full Pfeiffer Vacuum warranty. The Pfeiffer Adixen medium duty A3P series semiconductor dry vacuum pumps are based on the proven multi-stage Roots technology. The inside of the pumps is resistant to corrosive gases. For this reason, the pumps have high reliability on medium duty processes. The three available models from the series offer a wide spectrum of pumping speeds and thereby cover most requirements for medium duty vacuum pumps in the semiconductor industry. The Pfeiffer Adixen A3P series is suitable for operation in a clean room and complies with CE and Semi S2 standards.

The dry pumps are distinguished through their high reliability for applications in medium duty processes. The pumps from the series have a temperature sensor and inert gas flushing. A low noise emission and low vibration level are further characteristics of the Pfeiffer Adixen A3P series.

The Pfeiffer Adixen ADH, A4H, and A4X harsh processes series dry semiconductor vacuum pumps are chemical processes used, for example, in the semiconductor and coating industries. These processes are harsh because primarily aggressive and corrosive mediums are used and processed under vacuum. These mediums have the highest requirements for the design and quality of the process systems. Typical harsh duty processes are etching, chemical vapor deposition (CVD), atomic layer deposition (ALD) as well as metal organic chemical vapor deposition (MOCVD).

Since aggressive and corrosive chemicals are used in harsh duty processes, the vacuum pumps and components must be corrosion-resistant. In the applications of the semiconductor and coating industries, there is frequently an increased occurrence of powder, which may lead to accumulation in the vacuum pumps. Thus, it must be made sure that the process pumps in use are suitable for this amount of powder. In order to best avoid condensation inside the pumps, purge gas is used in combination with a sophisticated temperature management.

More information about these Pfeiffer Vacuum Test leak H2/He  can be found by downloading the pdf catalog and documents below. Simply open the pdf catalog below, run the pdf search (ctrl F) and search for the BG449025A.

Price

Product: Pfeiffer Vacuum Test leak H2/He, Pfeiffer Adixen Dry Multi Stage Roots Vacuum Pumps, Pfeiffer Adixen Dry Multi Stage Roots Vacuum Pumps,  PN  BG449025A

Condition: New
Warranty: Pfeiffer Vacuum Warranty
Part Number: BG449025A
Sale Price: $3,881.66

Currency US Dollar (USD)

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Manuals



AVAILABLE DOWNLOADS:
  Pfeiffer A 100L Standard Version, Low Voltage, RS232/RS485 Interface Data Sheet.pdf (0.58 MB)
  Pfeiffer A 200L Multi-Stage Roots Pump Dry Semiconductor Vacuum Pumps Brochure.pdf (0.68 MB)
  Pfeiffer A103P, A603P, A1003P Dry Semiconductor Vacuum Pumps Brochure.pdf (0.31 MB)
  Pfeiffer A4 Series Dry Multi-Stage Roots Semiconductor Vacuum Pumps Brochure.pdf (1.37 MB)
  Pfeiffer ACP 120G, ACG 600G Dry Semiconductor Vacuum Pumps Operating Instructions.pdf (6.74 MB)
  Pfeiffer ADH Series High Performance Dry Semiconductor Vacuum Pumps Brochure.pdf (1.33 MB)
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