Skip to main content
× Home Services Products Catalogs Downloads Tech Support About Contact Careers (505) 872-0037

(505) 872-0037

Shopping Cart Icon
cart
 
Login Icon
login
Ideal Vacuum Cube Sales Ideal Vacuum Command Valves Helium Leak Detectors On Sale New Scroll Pumps Agilent Helium Leak Detectors on Sale Turbo Pumps on Sale

Keyword       Ideal Vacuum Part Number       Manufacturer Part Number

× Vacuum Pumps Modular Vacuum Chambers Welded Vacuum Chambers Vacuum Chamber Systems Fittings and Flanges Feedthroughs Vacuum Valves Turbo Pump Systems Rebuild Kits, Parts, And Motors Vacuum Fluids, Oils, and Grease Filters Traps and Silencers Vacuum Ovens Helium Leak Detectors Gauges And Controllers Pressure Measurement Chillers

Ideal Vacuum XFE-5 Dry Mobile XeF2 Etching Small System.


The Ideal Vacuum XFE-5 Dry is a Xenon Difluoride (XeF2) Etch System, utilizes a completely dry process eliminating the stiction that typically occur during wet etching process. Our Ideal Vacuum XFE-5 Dry Etching System offers better performance than any other etch system in the market now days with etchant, etched depth, and instantaneous etch rate for Silicon (Si) etching with XeF2 in a pulsed etching system in real time. The traditional Techniques used with our XFE-5 Dry Etch System offers better performance on the nonlinear etch process, with the initial etch rate being the highest and monotonically decreasing as the etchant is being depleted. With an initial pressure of 565 mTorr of XeF2 an instantaneous etch rate of 4.1 µm/min in Silicon was recorded.

Condition: New



Product Number: P1010226



Price: $39,950.00



Ideal Vacuum XFE-10 Dry Mobile XeF2 Etching Medium System.


The Ideal Vacuum XFE-10 Dry is a Xenon Difluoride (XeF2) Etch System, utilizes a completely dry process eliminating the stiction that typically occur during wet etching process. Our Ideal Vacuum XFE-10 Etching system offers better performance than any other etch system in the market now days with etchant, etched depth, and instantaneous etch rate for Silicon (Si) etching with XeF2 in a pulsed etching system in real time. The traditional Techniques used with our XFE-10 Dry Etch System offers better performance on the nonlinear etch process, with the initial etch rate being the highest and monotonically decreasing as the etchant is being depleted. With an initial pressure of 565 mTorr of XeF2 an instantaneous etch rate of 4.1 µm/min in Silicon was recorded.

Condition: New



Product Number: P1010240



Price: $49,950.00



Ideal Vacuum XFE-20 Dry Mobile XeF2 Etching Large System.


The Ideal Vacuum XFE-20 Dry is a Xenon Difluoride (XeF2) Etch System, utilizes a completely dry process eliminating the stiction that typically occur during wet etching process. Our Ideal Vacuum XFE-20 Dry Etching System offers better performance than any other etch system in the market now days with etchant, etched depth, and instantaneous etch rate for Silicon (Si) etching with XeF2 in a pulsed etching system in real time. The traditional Techniques used with the Ideal Vacuum XFE-20 Dry Etch System offers better performance on the nonlinear etch process, with the initial etch rate being the highest and monotonically decreasing as the etchant is being depleted. With an initial pressure of 565 mTorr of XeF2 an instantaneous etch rate of 4.1 µm/min in Silicon was recorded.

Condition: New



Product Number: P1010241



Price: $59,950.00



Ideal Vacuum Logo Water Mark
CONTACT US
Ideal Vacuum Products, LLC
5910 Midway Park Blvd NE,
Albuquerque, NM 87109-5805

Phone: (505) 872-0037
Fax: (505) 872-9001
info@idealvac.com