Skip to main content
× Home Services Products Catalogs Downloads TechSupport About Contact Careers (505) 872-0037

(505) 872-0037

Shopping Cart Icon
Cart
 
Login Icon
Login
Language Selector
en-de
×
Americas
Europe
Middle East & Africa
Asia Pacific & Japan
Pfeiffer ASM340 Leak Detectors On Sale Agilent IDP-7 Dry Scroll Vacuum Pumps On Sale Agilent Varian Helium Leak Detectors On Sale Ideal Vacuum XG-110 Portable Digital Thermocouple Controllers On Sale Ideal Vacuum XG-120 Digital Thermocouple Gauges On Sale Adixen 2021C2 Pumps On Sale

Keyword       Part Number:      

× Vacuum Pumps Modular Vacuum Chambers Stainless Steel Vacuum Chambers Aluminum Vacuum Chambers ExploraVAC Unlimited Chambers ExploraVAC Vacuum Chambers Fittings and Flanges Feedthroughs Vacuum Valves Rebuild Kits, Parts, And Motors Vacuum Fluids, Oils, and Greases Turbo Pumps And Controllers Filters Traps and Silencers Convection and Vacuum Ovens Leak Detection and RGA Vacuum Pressure Measurement Recirculating Chillers And Water Baths
The Pfeiffer Adixen medium duty A3P series semiconductor dry vacuum pumps are based on the proven multi-stage Roots technology. The inside of the pumps is resistant to corrosive gases. For this reason, the pumps have high reliability on medium duty processes. The three available models from the series offer a wide spectrum of pumping speeds and thereby cover most requirements for medium duty vacuum pumps in the semiconductor industry. The Pfeiffer Adixen A3P series is suitable for operation in a clean room and complies with CE and Semi S2 standards.

The dry pumps are distinguished through their high reliability for applications in medium duty processes. The pumps from the series have a temperature sensor and inert gas flushing. A low noise emission and low vibration level are further characteristics of the Pfeiffer Adixen A3P series.

The Pfeiffer Adixen ADH, A4H, and A4X harsh processes series dry semiconductor vacuum pumps are chemical processes used, for example, in the semiconductor and coating industries. These processes are harsh because primarily aggressive and corrosive mediums are used and processed under vacuum. These mediums have the highest requirements for the design and quality of the process systems. Typical harsh duty processes are etching, chemical vapor deposition (CVD), atomic layer deposition (ALD) as well as metal organic chemical vapor deposition (MOCVD).

Since aggressive and corrosive chemicals are used in harsh duty processes, the vacuum pumps and components must be corrosion-resistant. In the applications of the semiconductor and coating industries, there is frequently an increased occurrence of powder, which may lead to accumulation in the vacuum pumps. Thus, it must be made sure that the process pumps in use are suitable for this amount of powder. In order to best avoid condensation inside the pumps, purge gas is used in combination with a sophisticated temperature management.

More information about these
107170.317
Pfeiffer Vacuum PUMP 3004XV2 SC CC S LS 1 6, Pfeiffer-Adixen Dry Multi-Stage Roots Vacuum Pumps, Pfeiffer Adixen Dry Multi Stage Roots Vacuum Pumps,  PN  F4XI7SLS1683110
×

Load

Description

  
Pfeiffer Vacuum PUMP 3004XV2 SC CC S LS 1 6, Pfeiffer-Adixen Dry Multi-Stage Roots Vacuum Pumps, Pfeiffer Adixen Dry Multi Stage Roots Vacuum Pumps,  PN  F4XI7SLS1683110

These Pfeiffer Vacuum PUMP 3004XV2 SC CC S LS 1 6  have part number F4XI7SLS1683110, are new, and come with full Pfeiffer Vacuum warranty. The Pfeiffer Adixen medium duty A3P series semiconductor dry vacuum pumps are based on the proven multi-stage Roots technology. The inside of the pumps is resistant to corrosive gases. For this reason, the pumps have high reliability on medium duty processes. The three available models from the series offer a wide spectrum of pumping speeds and thereby cover most requirements for medium duty vacuum pumps in the semiconductor industry. The Pfeiffer Adixen A3P series is suitable for operation in a clean room and complies with CE and Semi S2 standards.

The dry pumps are distinguished through their high reliability for applications in medium duty processes. The pumps from the series have a temperature sensor and inert gas flushing. A low noise emission and low vibration level are further characteristics of the Pfeiffer Adixen A3P series.

The Pfeiffer Adixen ADH, A4H, and A4X harsh processes series dry semiconductor vacuum pumps are chemical processes used, for example, in the semiconductor and coating industries. These processes are harsh because primarily aggressive and corrosive mediums are used and processed under vacuum. These mediums have the highest requirements for the design and quality of the process systems. Typical harsh duty processes are etching, chemical vapor deposition (CVD), atomic layer deposition (ALD) as well as metal organic chemical vapor deposition (MOCVD).

Since aggressive and corrosive chemicals are used in harsh duty processes, the vacuum pumps and components must be corrosion-resistant. In the applications of the semiconductor and coating industries, there is frequently an increased occurrence of powder, which may lead to accumulation in the vacuum pumps. Thus, it must be made sure that the process pumps in use are suitable for this amount of powder. In order to best avoid condensation inside the pumps, purge gas is used in combination with a sophisticated temperature management.

More information about these Pfeiffer Vacuum PUMP 3004XV2 SC CC S LS 1 6  can be found by downloading the pdf catalog and documents below. Simply open the pdf catalog below, run the pdf search (ctrl F) and search for the F4XI7SLS1683110.

Price

Product: Pfeiffer Vacuum PUMP 3004XV2 SC CC S LS 1 6, Pfeiffer Adixen Dry Multi Stage Roots Vacuum Pumps, Pfeiffer Adixen Dry Multi Stage Roots Vacuum Pumps,  PN  F4XI7SLS1683110

Condition: New
Warranty: Pfeiffer Vacuum Warranty
Part Number: F4XI7SLS1683110
Sale Price: €107,170.32

Currency Euro (Euro)

QTY:   

Manuals



AVAILABLE DOWNLOADS:
  Pfeiffer A 100L Standard Version, Low Voltage, RS232/RS485 Interface Data Sheet.pdf (0.58 MB)
  Pfeiffer A 200L Multi-Stage Roots Pump Dry Semiconductor Vacuum Pumps Brochure.pdf (0.68 MB)
  Pfeiffer A103P, A603P, A1003P Dry Semiconductor Vacuum Pumps Brochure.pdf (0.31 MB)
  Pfeiffer A4 Series Dry Multi-Stage Roots Semiconductor Vacuum Pumps Brochure.pdf (1.37 MB)
  Pfeiffer ACP 120G, ACG 600G Dry Semiconductor Vacuum Pumps Operating Instructions.pdf (6.74 MB)
  Pfeiffer ADH Series High Performance Dry Semiconductor Vacuum Pumps Brochure.pdf (1.33 MB)
Marca de agua con el logotipo de Ideal Vacuum
CONTACT US
Ideal Vacuum Products , LLC
5910 Midway Park Blvd NE
Albuquerque, New Mexico 87109-5805 USA

Phone: (505) 872-0037
Fax: (505) 872-9001
info@idealvac.com